CMA Series Polishing Fluid High Dirt Holding Filter Cartridge
Product Overview
CMA Series polishing fluid high dirt holding filter cartridge is designed for the filtration of bulk particles and colloids in oxide CMP, tungsten CMP, and copper CMP processes.
This series uses gradient treatment and a unique gradual pore size design. The pore size gradually decreases from outside to inside, allowing large particles and agglomerates to be captured while useful polishing particles can pass through. This structure helps improve filtration efficiency, increase dirt holding space, reduce clogging, and extend filter service life.
With all-polypropylene construction, low precipitation, broad chemical compatibility, and optional micron ratings from 0.1 μm to 90 μm, CMA Series is suitable for different polishing liquid filtration requirements.
Key Features
Gradient Filtration Structure
The pore size of the filter media gradually decreases from outside to inside. This structure helps trap large particles and release effective polishing particles, providing a larger effective filtration area and higher dirt holding capacity.
Low Precipitation
The cartridge is made with all-PP construction and produced without adhesives or surfactants. This helps reduce precipitation and leaching risks during filtration.
Broad Chemical Compatibility
The polypropylene structure provides good chemical compatibility and is suitable for filtration of various polishing liquids and process fluids.
Optional Multiple Micron Ratings and Interfaces
Micron ratings from 0.1 μm to 90 μm are available to meet different polishing process requirements. Different lengths and interface types can also be customized for use with different filter housings.
Technical Specifications
| Item | Specification |
|---|
| Product Series | CMA Series |
| Product Type | Polishing Fluid High Dirt Holding Filter Cartridge |
| Filter Media | Polypropylene PP |
| Cage / Core / End Caps | Polypropylene PP |
| Structure | Gradient pore size filtration structure |
| Micron Rating | 0.1 μm – 90 μm |
| Main Application | Polishing liquid filtration, CMP slurry filtration |
| Maximum Operating Temperature | 70°C |
| Maximum Operating Differential Pressure | 4 bar @ 21°C；2.4 bar @ 70°C |
| Construction | All-PP structure, no adhesives, no surfactants |
| Customization | Micron rating, length, end cap type and interface type can be customized |
Ordering Information
| Series | Micron | Length | End Cap Type | Seal Material |
|---|
| CMA | 0010=0.1μm 1000=10μm 0050=0.5μm
0100=1.0μm 4000=40um
0150=1.5um 0200=2.0μm 7000=70μm
0500=5.0μm 9000=90μm | 10=10"
20=20"
30=30
40=40" | C3=222/Fin
C5=222/Flat
C9=DOE | E=EPDM V=Viton |
Recommended Industries
| Industry | Application |
|---|
| Semiconductor | Oxide CMP, tungsten CMP, copper CMP slurry filtration |
| Electronics Manufacturing | Polishing liquid filtration and particle control |
| Wafer Processing | CMP process filtration |
| Display / FPD | Precision polishing fluid filtration |
| Precision Surface Treatment | Bulk particle and colloid removal |
Product Advantages
Compared with ordinary PP filter cartridges, CMA Series is specially designed for polishing liquid and CMP slurry filtration. Its gradient filtration structure helps capture large particles while maintaining effective polishing components in the liquid.
The high dirt holding capacity can reduce blockage, extend service life, and lower filter replacement frequency. The all-PP adhesive-free structure also helps control precipitation and improve process cleanliness.
Support & Services
We provide comprehensive technical support for installation, operation, and maintenance, including filter replacement guidance and maintenance recommendations. Complete documentation includes user manuals, installation guides, and troubleshooting notes.
Company Profile
Shanghai Pullner Filtration Technology Co., Ltd. was established in May 2011 with a registered capital of RMB 26 million. The company operates a Class 100,000 cleanroom workshop (3,000 m²) and an on-site Class 1,000 clean laboratory, integrating R&D, manufacturing, and sales of microporous membrane filtration equipment and filtration systems.
Pullner products are widely applied in microelectronics, fine chemicals, new energy, seawater desalination, biotech, and laboratory fields, including LCD panels, semiconductor processing, high-purity chemicals, condensate filtration, and reclaimed water reuse.
The company holds ISO9001 / ISO14001 / ISO45001 certificates, is recognized as a high-tech enterprise, and owns multiple patents. Pullner is also an approved vendor of Saudi Aramco.
Frequently Asked Questions
Q1: Who is the manufacturer and brand?
A1: Manufacturer: Shanghai Pullner Filtration Technology Co., Ltd. / Brand: Pullner.
Q2: Can you provide samples?
A2: Yes. We can provide 1-2 free samples for evaluation. Buyers only cover shipping. (Free samples are typically supported for future formal orders.)
Q3: What is the delivery time?
A3: Usually 5-10 working days, depending on order quantity.
Q4: Is the filtration rating nominal or absolute?
A4: Standard products are nominal. Absolute-rated filters can be customized based on your application.
Q5: Which brands can your filters replace?
A5: Compatible replacements include major brands such as PALL, 3M, PARKER, and others.
Q6: What is the MOQ?
A6: Standard MOQ is 1 piece (factory direct). For certain models or customized specs, MOQ may vary.
Pullner Laboratory
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